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- W644477035 abstract "High-k/metal gate stacks have been introduced in CMOS technology during the last decade in order to sustain continued device scaling and ever-improving circuit performance. Starting from the 45 nm ..." @default.
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- W644477035 date "2014-01-01" @default.
- W644477035 modified "2023-09-26" @default.
- W644477035 title "Integration of thulium silicate for enhanced scalability of high-k/metal gate CMOS technology" @default.
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