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- W649521046 abstract "Al-doped and F-doped ZnO (ZnO : Al & ZnO : F) thin films were coated onto glass substrate by sol-gel method. These films showed c-axis orientation in common, but different I(002)/[I(002) + I(101)] and FWHM (full width at half-maximum). In particular, the grain size of the ZnO : Al films decreased with the increase in the Al-doping concentration, while for the ZnO : F films the grain siae increased up to F 3 at% and then decreased. For the electrical properties, Hall effect measurement was used. The resistivity of the ZnO : Al films and the ZnO : F films were, respectively, at Al 1 at% and at F 3 at%. Moreover compared with ZnO:Al films, ZnO:F films have lower carrier concentration (ZnO : Al , ZnO : F ) and higher mobility (ZnO : Al , ZnO : F ). For average optical transmittances, ZnO : Al thin films have and ZnO : F films have comparatively low." @default.
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- W649521046 date "2006-04-01" @default.
- W649521046 modified "2023-09-24" @default.
- W649521046 title "Electrical and optical properties of Al and F doped ZnO transparent conducting film by sol-gel method" @default.
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