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- W657387119 abstract "For the fabrication of microwave or optoelectronic devices on InP materials, different etching techniques are used such as classical chemical etching, or preferential chemical etching following crystallographic orientation [1,2], or plasma etching and photoetching [3–7]. With our scanning optical microscope, the light spot is used to etch photochemically n-type InP samples immersed in several basic or acidic solutions.KeywordsEtching RatePhosphorus AtomPlasma EtchingLight PowerEtching TechniqueThese keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves." @default.
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- W657387119 date "1984-01-01" @default.
- W657387119 modified "2023-09-25" @default.
- W657387119 title "Photochemical Microetching of InP" @default.
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- W657387119 doi "https://doi.org/10.1007/978-3-642-82381-7_45" @default.
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