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• W658484927 endingPage "073001" @default.
• W658484927 startingPage "073001" @default.
• W658484927 abstract "The variation of the resonance field and the Gilbert damping parameter (G) with hcp Co film thickness was evaluated by measuring the X- and Q-band ferromagnetic resonance (FMR) for buffer-layer/Co (2–16 nm)/Cu (1 nm)/Pt (15 nm) films. The two types of hcp Co films were deposited at a substrate temperature (Tsub) of either 400 °C or room temperature using a magnetron sputtering system. The G values for the Co films with Tsub = 400 °C exhibited a more rapid increase with decreasing thickness. In addition, the effective linewidth of FMR spectrum exhibited more rapid increase in the Q-band FMR for Tsub = 400 °C. The experimental results suggest that the spin-pumping is enhanced to a greater extent in the Co films fabricated at Tsub = 400 °C. Judging from the structural analysis of the Co films, it is possible that grain growth involving atomically flat surfaces of Co films might enhance the spin-pumping efficiency." @default.
• W658484927 created "2016-06-24" @default.
• W658484927 creator A5017039171 @default.
• W658484927 creator A5025813689 @default.
• W658484927 date "2015-06-03" @default.
• W658484927 modified "2023-10-09" @default.
• W658484927 title "Enhanced spin-pumping efficiency in hcp Co polycrystalline films obtained by sputtering deposition with high substrate temperature" @default.
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• W658484927 doi "https://doi.org/10.7567/jjap.54.073001" @default.
• W658484927 hasPublicationYear "2015" @default.
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