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- W67686897 abstract "New developments in the understanding of basic device parameters important to the operation of infrared lasers and detectors in the lead and lead- tin chalcogenides are reviewed. These include: (1) the diffusion parameters which determine the depth of p-n junctions, the concentration profiles near the junctions, and other parameters necessary for annealing and processing these nonstoichiometric compounds; (2) the high electric field transport properties which give information on the rates of impact ionization and the velocity saturation of charge carriers in junction devices; and (3) the surface properties which determine the ohmic or rectifying behavior of metal-semiconductor contacts and which permit an unusual metal-semiconductor minority carrier injection mechanism. (auth)" @default.
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- W67686897 date "1972-08-01" @default.
- W67686897 modified "2023-09-27" @default.
- W67686897 title "Basic device properties in the lead chalcogenides" @default.
- W67686897 hasPublicationYear "1972" @default.
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