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- W69224963 abstract "Lithography plays a key roll in modern IC manufacturing industry. The increased performance of modern IC devices is strongly linked to an increase of lithographic resolution. For lithographic mask production and patterning of features down to a few performance, electron beam lithography (EBL) is a well established technique. Transferring the mask pattern into resist on an industrial high throughput level is mainly the domain of optical lithography. Using resolution enhancement techniques (RET), it possible to achieve dimensions of the order of 100 nm. According to the International Technology Roadmap for Semiconductors (ITRS) sub 100 nm patterning is a great demand for next generation lithography (NGL). Advanced technologies, such as extreme ultraviolet lithography (EUV), X-ray lithography (XRL), electron projection lithography (EPL), and ion projection lithography (IPL) are pushing towards into the domain of 35 nm.1" @default.
- W69224963 created "2016-06-24" @default.
- W69224963 creator A5014952558 @default.
- W69224963 creator A5024244888 @default.
- W69224963 creator A5038306679 @default.
- W69224963 date "2003-01-01" @default.
- W69224963 modified "2023-10-03" @default.
- W69224963 title "Combined Approaches for Nanoelectronic Device Fabrication" @default.
- W69224963 cites W1435871644 @default.
- W69224963 cites W1984490429 @default.
- W69224963 cites W1994728170 @default.
- W69224963 cites W2005485153 @default.
- W69224963 cites W2018944693 @default.
- W69224963 cites W2022948920 @default.
- W69224963 cites W2062074587 @default.
- W69224963 cites W2102183493 @default.
- W69224963 cites W2110590541 @default.
- W69224963 cites W2126285240 @default.
- W69224963 doi "https://doi.org/10.1007/978-1-4419-9204-8_12" @default.
- W69224963 hasPublicationYear "2003" @default.
- W69224963 type Work @default.
- W69224963 sameAs 69224963 @default.
- W69224963 citedByCount "0" @default.
- W69224963 crossrefType "book-chapter" @default.
- W69224963 hasAuthorship W69224963A5014952558 @default.
- W69224963 hasAuthorship W69224963A5024244888 @default.
- W69224963 hasAuthorship W69224963A5038306679 @default.
- W69224963 hasConcept C105487726 @default.
- W69224963 hasConcept C137905882 @default.
- W69224963 hasConcept C162996421 @default.
- W69224963 hasConcept C163581340 @default.
- W69224963 hasConcept C171250308 @default.
- W69224963 hasConcept C177409738 @default.
- W69224963 hasConcept C182873914 @default.
- W69224963 hasConcept C192562407 @default.
- W69224963 hasConcept C200274948 @default.
- W69224963 hasConcept C204223013 @default.
- W69224963 hasConcept C2779227376 @default.
- W69224963 hasConcept C41794268 @default.
- W69224963 hasConcept C49040817 @default.
- W69224963 hasConcept C53524968 @default.
- W69224963 hasConcept C70520399 @default.
- W69224963 hasConcept C94263209 @default.
- W69224963 hasConceptScore W69224963C105487726 @default.
- W69224963 hasConceptScore W69224963C137905882 @default.
- W69224963 hasConceptScore W69224963C162996421 @default.
- W69224963 hasConceptScore W69224963C163581340 @default.
- W69224963 hasConceptScore W69224963C171250308 @default.
- W69224963 hasConceptScore W69224963C177409738 @default.
- W69224963 hasConceptScore W69224963C182873914 @default.
- W69224963 hasConceptScore W69224963C192562407 @default.
- W69224963 hasConceptScore W69224963C200274948 @default.
- W69224963 hasConceptScore W69224963C204223013 @default.
- W69224963 hasConceptScore W69224963C2779227376 @default.
- W69224963 hasConceptScore W69224963C41794268 @default.
- W69224963 hasConceptScore W69224963C49040817 @default.
- W69224963 hasConceptScore W69224963C53524968 @default.
- W69224963 hasConceptScore W69224963C70520399 @default.
- W69224963 hasConceptScore W69224963C94263209 @default.
- W69224963 hasLocation W692249631 @default.
- W69224963 hasOpenAccess W69224963 @default.
- W69224963 hasPrimaryLocation W692249631 @default.
- W69224963 hasRelatedWork W1982708586 @default.
- W69224963 hasRelatedWork W2042473800 @default.
- W69224963 hasRelatedWork W2327331308 @default.
- W69224963 hasRelatedWork W2735780784 @default.
- W69224963 hasRelatedWork W2748952813 @default.
- W69224963 hasRelatedWork W2899084033 @default.
- W69224963 hasRelatedWork W2946673320 @default.
- W69224963 hasRelatedWork W3039921875 @default.
- W69224963 hasRelatedWork W4240308501 @default.
- W69224963 hasRelatedWork W2059369291 @default.
- W69224963 isParatext "false" @default.
- W69224963 isRetracted "false" @default.
- W69224963 magId "69224963" @default.
- W69224963 workType "book-chapter" @default.