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- W70934952 abstract "Magnetron sputtering of silicon in argon-hydrogen plasma at a deposition temperature of 250-300/sup 0/C and relative partial hydrogen pressure of 40% and higher permits fabricating amorphous hydrogenated silicon films with optical properties, dark conduction, and with an amount and form of bound hydrogen similar to the properties of films prepared by the method of decomposition of silane. The photoconductivity of these films is inferior to the conductivity of the films formed on decomposition of silane. The experimental results are in agreement with the concept of the columnar microstructure of the films fabricated at low support temperatures. The formation of such a micro-structure is accompanied by the di- and trihydride form of entry of hydrogen into the films and oxidation of the films in air." @default.
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- W70934952 date "1987-10-01" @default.
- W70934952 modified "2023-09-26" @default.
- W70934952 title "Physical properties of amorphous hydrogenated silicon films prepared by magnetron sputtering" @default.
- W70934952 hasPublicationYear "1987" @default.
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