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- W7463913 abstract "The dependence of the carrier concentration on the implantation dose and on the temperature was investigated in ion-implanted thin films of Pb1−xSnxTe (0⩽x<0.1). By assuming a twofold defect level in the conduction band we are able to fit the experimental results. With increasing tin content the energy of the defect level shifts towards the conduction-band edge. By extending the results to SnTe a general model for the understanding of the electrical properties of ion-implanted Pb1−xSnxTe (0⩽x⩽1) is suggested." @default.
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- W7463913 date "1980-09-01" @default.
- W7463913 modified "2023-10-16" @default.
- W7463913 title "Ion-implantation-induced damage and resonant levels inPb1−<i>x</i>Sn<i>x</i>Te" @default.
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- W7463913 doi "https://doi.org/10.1063/1.328283" @default.
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