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- W749137698 abstract "We developed a pulsed laser deposition(PLD) apparatus for depositing various thin films. In this study, the formation of thin film was performed in the vacuum chamber by PLD method. (012) and Si(111) were used as the substrates. In order to investigate the growth conditions of a high crystalline thin film, the S/Nb composition ratio was varied from 2.0 to 5.25 and the substrate temperature was varied from the room temperature to . From the result of X-ray diffraction studies of the prepared thin films, it was reported that the , thin film showed a good crystallinity at substrate temperature and with S/Nb composition ratio 4.0 on (012) but did not on Si(111). The films exhibited c-axis orientation." @default.
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- W749137698 date "1998-01-01" @default.
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- W749137698 title "Preparation of $NbS_2$ thin film using PLD method" @default.
- W749137698 hasPublicationYear "1998" @default.
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