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- W751506469 abstract "A survey of optical properties of sputtered materials in the spectral range of 145 nm to 800 nm has been performed. The optical constants n and k have been measured using ellipsometric techniques. Four combination materials have been created with the properties suitable for application in Attenuated Phase Shift Mask (APSM) manufacturing. The four combination materials have also been characterized, with the results presented. To Rose of Sharon Daly, whose incessant nagging made completion of this work possible." @default.
- W751506469 created "2016-06-24" @default.
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- W751506469 date "2003-01-01" @default.
- W751506469 modified "2023-09-23" @default.
- W751506469 title "Optical properties of materials for 157 nm lithography" @default.
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