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- W76077589 abstract "A round-robin characterization is reported on the sputter depth profiling of [60×(3.0 nm Mo/ 0.3 nm B4C/ 3.7 nm Si)] and [60×(3.5 nm Mo/ 3.5 nm Si)] stacks deposited on Si (111). Two different commercial secondary ion mass spectrometers with time-of-flight and magnetic-sector analyzers and a pulsed radio frequency glow discharge optical emission spectrometer were used. The pros and cons of each instrumental approach are discussed." @default.
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- W76077589 date "2013-07-13" @default.
- W76077589 modified "2023-09-27" @default.
- W76077589 title "Depth Profiling of Multilayer Mo/Si Nanostructures" @default.
- W76077589 hasPublicationYear "2013" @default.
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