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• W76561257 abstract "Abstract An ultra high vacuum SEM of low energy (UHV-LE-SEM) has been developed for surface analysis combined with electron energy spectroscopy and reflection electron diffraction. The most sensitive primary electron energy of SEM image to the surface analysis was experimentally measured as a function of the primary electron energy Ep in a range of 100 eV to 3 keV and was several hundred eV for an absorption electron image on Si from the observations of the contrast change due to the surface adsorption and desorption less than one monolayer. The secondary or absorption electron image has a very high sensitivity to the surface and detects the surface change of 10-2 to 10-3 monolayer in coverage. The sensitivity is 102 to 103 times higher than that of the Auger electron image. The point analysis by the low energy electron spectroscopy has been performed at the same time in a spatial resolution of 0.1 ?m. Some examples of surface microanalysis by UHV-LE-SEM for cleaning process of Si(lll) surface and surface segregation of SUS-304 L stainless steel by heat treatment are shown. Furthermore, some experimentals of the angular resolved secondary electron and the angular resolved electron loss spectroscopies are demonstrated as a new technique of the surface analysis and it is found that those spectra change distinctly by the effect of the electron diffraction with respect to the incident and diffracted beams for single crystal specimens." @default.
• W76561257 created "2016-06-24" @default.
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• W76561257 date "1982-01-01" @default.
• W76561257 modified "2023-09-27" @default.
• W76561257 title "ANALYTICAL SCANNING ELECTRON MICROSCOPY IN UHV FOR SOLID SURFACE" @default.
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• W76561257 doi "https://doi.org/10.1016/b978-0-08-026221-5.50021-0" @default.
• W76561257 hasPublicationYear "1982" @default.
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