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- W77307975 abstract "ABSTRACT We present measurements on X-ray diffraction, optical absorption, electrical conductivity and hall mobilities of pure and doped amorphous silicon thin films prepared by thermal evaporation under high vacuum. The optical investigations showed that the energy gap increases with increasing annealing temperature for both the pure and As, P, In and B doped samples. However our results showed that the energy gap, in general, for doped amorphous Si is higher than its value in the pure amorphoud Si. On the other hand we found that the energy gap decreases with increasing substrate temperature. The Hall effect experiment evidenced that amorphous Si prepared by thermal evaporation could be doped. The Hall mobility is observed to increase with temperature for both p- and n-type amorphous Si, up to certain temperature. Also the Hall mobility is found to increase with increasing dopant percentages." @default.
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- W77307975 date "1988-01-01" @default.
- W77307975 modified "2023-09-27" @default.
- W77307975 title "OPTICAL, ELECTRICAL PROPERTIES AND HALL MOBILITIES OF AMORPHOUS Si THIN FILMS" @default.
- W77307975 cites W2171950158 @default.
- W77307975 doi "https://doi.org/10.1016/b978-0-08-034315-0.50036-7" @default.
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