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- W78411423 abstract "A new temperature dependant model for the Ge-B pairing mechanism has been established and implemented in a process simulator. The combination of both lattice strain effects and GeB clustering has been successfully applied to various anneals. The match with experimental SIMS profiles is excellent." @default.
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- W78411423 date "2001-01-01" @default.
- W78411423 modified "2023-09-25" @default.
- W78411423 title "A Novel Model for Boron Diffusion in SiGe Strained Layers Based on a Kinetics Driven Ge-B Pairing Mechanism" @default.
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- W78411423 doi "https://doi.org/10.1007/978-3-7091-6244-6_4" @default.
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