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• W785800855 abstract "/Si substrate by the pulsed laser deposition process. The morphologies and physical properties of deposited films were characterized by using X-ray diffractometer, HR-SEM, and Impedance Analyzer. XRD data and SEM images of the films indicate that each layer was well deposited alternatively in the superlattice structure. The dielectric constant of BaTiO" @default.
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• W785800855 date "2009-01-20" @default.
• W785800855 modified "2023-09-24" @default.
• W785800855 title "Properties of MTiO3(M = Sr, Ba) and PbM'O3(M'= Ti, Zr) Superlattice Thin Films Fabricated by Laser Ablation" @default.
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• W785800855 doi "https://doi.org/10.5012/bkcs.2009.30.1.201" @default.
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