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- W79074401 abstract "A literature review is given on the decomposition of positive and negative photoresists under the action of actinic light and electron bombardment. The interaction of the electron current with other organic materials, metals, and inorganic dielectrics vas examined. The internal irradiation mechanism of the resists was reduced to the fact that the electrons passing through the resist excites the molecules of the resists with subsequent luminescence and phosphorescence. The effect of the metallic and dielectric backing on the production of lines of necessary width was examined. It was shown that the crosslinking process of the negative photoresists under the action of an electron beam occurs by free-radical polymerization mechanism. (tr-auth)" @default.
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- W79074401 date "1972-09-01" @default.
- W79074401 modified "2023-09-26" @default.
- W79074401 title "Mechanism of electron-beam effects on organic photoresists" @default.
- W79074401 hasPublicationYear "1972" @default.
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