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- W79485564 abstract "In this paper the authors use an analytical method to evaluate the influence of doping profile shape and surface recombination velocity on steady-state electrical behaviour and quantum efficiency of silicon solar cell emitters. The influence of surface recombination velocity on emitter characteristics for both implanted and diffused emitter profiles is studied and compared. The role of the presence of an oxide layer, during implantation and/or annealing is discussed. The authors show that a better spectral response can be obtained using multiple ion implantation as compared to using dopant diffusion." @default.
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- W79485564 date "1988-01-01" @default.
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- W79485564 title "Electrical behaviour of heavily doped emitters formed by ion implantation" @default.
- W79485564 hasPublicationYear "1988" @default.
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