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• W809940772 abstract "Copper and aluminum selective deposition using (hfac)Cu(VTMS) and DMEAA precursors were performed in a warm-wall low pressure chemical vapour deposition reactor. The films of Cu and AI deposited on Corning 7059 glass and quartz with pattern of Cr seed metal. Selective deposition can be achieved at a pressure range of from 10-1 to 10 torr and substrate temperature range of 150-25. Selective deposition of Cu and AI by CVD is one of candidate for gate material formation fo larger area and high resolution plat panel displays." @default.
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• W809940772 date "1995-01-01" @default.
• W809940772 modified "2023-09-23" @default.
• W809940772 title "The Low Resistivity Gate Metals Formation of Thin Film Transistors by Selective CVD" @default.
• W809940772 hasPublicationYear "1995" @default.
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