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- W817805539 abstract "In this paper, we report the properties of Mo metal employed as PMOS gate electrode. Mo on <TEX>$SiO_2$</TEX> was observed to be stable up to <TEX>$900^{circ}C$</TEX> by analyzing the Interface with XRD. C-V measurement was performed on the fabricated MOS capacitor with Mo Bate on <TEX>$SiO_2$</TEX>. The stability of EOT and work-function was verified by comparing the C-V curves measured before and after annealing at 600, 700, 800, and <TEX>$900^{circ}C$</TEX>. C-V hysteresis curve was performed to identify the effect of fired charge. Gate-injection and substrate-injection of carrier were performed to study the characteristics of <TEX>$Mo-SiO_2$</TEX> and <TEX>$SiO_2-Si$</TEX> interface. Sheet resistance of Mo metal gate obtained from 4-point probe was less than <TEX>$10;OmegaBox$</TEX> that was much lower than that of polysilicon." @default.
- W817805539 created "2016-06-24" @default.
- W817805539 date "2005-07-01" @default.
- W817805539 modified "2023-09-25" @default.
- W817805539 title "Analysis of PMOS Capacitor with Thermally Robust Molybdenium Gate" @default.
- W817805539 doi "https://doi.org/10.4313/jkem.2005.18.7.594" @default.
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