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- W819225022 abstract "It is very important to consider the distribution of range, range straggling and lateral spread of ions implanted into semiconductor materials in design and fabrication of semiconductor integration devices by ion implantation. Er ions with energy of 400 keV were implanted in 6H-SiC crystal samples under the angles of 0°, 45° and 60°, respectively. The lateral spread of Er ions with dose of 5×10 15 cm -2 at energy of 400 keV implanted in 6H-SiC crystal were measured by Rutherford backscattering technique. The measured lateral spread is compared with TRIM98 and SRIM2006 codes prediction. It is seen that the experimental lateral spread well justifies the theoretical values. The value from TRIM98 agrees somewhat better to the experimental data than the value obtained based on SRIM2006." @default.
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- W819225022 date "2010-01-01" @default.
- W819225022 modified "2023-09-24" @default.
- W819225022 title "Investigation of the lateral spread of Er ions implanted in 6H-SiC" @default.
- W819225022 doi "https://doi.org/10.7498/aps.59.6390" @default.
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