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- W8211086 abstract "This chapter discusses on a thorough analysis and description of Ar/H2/CH4 discharges ignited in microwave cavity systems and employed for nanocrystalline diamond layer deposition. The purpose is to describe the methodology and tools that must be implemented to improve the understanding and the control of the synthesis process. Low-pressure glow discharges are widely used for material surface processing, such as etching, deposition of thin films, or modifications of surface properties. In the field of diamond film synthesis using plasma-enhanced chemical vapor deposition (PECVD) systems, attention should be paid to the absolute density of key species. Optical emission spectroscopy (OES) is the most popular plasma diagnostic technique because it can be easily implemented and is cost effective. The calculation results are analyzed and discussed, especially in terms of C2 production mechanisms and efficiency." @default.
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- W8211086 date "2006-01-01" @default.
- W8211086 modified "2023-09-30" @default.
- W8211086 title "Plasma-Assisted Synthesis" @default.
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- W8211086 doi "https://doi.org/10.1016/b978-081551524-1.50008-1" @default.
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