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- W839984881 abstract "In this work, amorphous hydrogenated carbon thin films also containing bromine were produced by two techniques: Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Immersion Ion Implantation and Deposition (PIIID). Depositions were realized in plasmas fed with different proportions of bromoform (CHBr3) and acetylene (C2H2), the parameters deposition time, applied radio frequency power, and reactor pressure were also varied. The film thickness and roughness, and wettability were measured, for films deposited onto glass substrates using perfilometry and goniometry (contact-angle measurements), respectively. Infrared Reflection-Absorption Spectroscopy (IRRAS) and X-Ray Photoelectron Spectroscopy (XPS) were employed to study the chemical structure and composition of films deposited onto polished stainless-steel substrates. Transmission ultraviolet-visible-near infrared spectroscopy (UVS) was used to characterize films deposited onto quartz substrates. From the UVS spectra and film thicknesses, optical properties such as refractive index, absorption coefficient and optical gap were calculated. Bromine-containing film deposition rates ranged from 33 to 108 nm.min for PECVD, and from 13 to 56 nm.min for PIIID. Roughnesses of between 24 e 37 nm were observed for both techniques. Contact angle measurements revealed that brominated films are hydrofobic. Characteristic absorptions owing to the presence in the films of bromine-containing groups at 1430-1410 cm due to asymmetric bending of CH2-Br e CH3-Br groups, and at 1210 cm also due to asymmetric bending of CH2-Br were observed in IRRAS spectra of the brominated films. As confirmed by XPS analyses, bromine was incorporated at up to 43%at in films deposited in CHBr3 plasmas. The refractive index decreased from 2.38 for plasma-polymerized C2H2 film to 1.5 for films produced by PECVD, and to 1.8 for films produced by PIIID. The optical gap, calculated by two different techniques, revealed values between 1.6 and 1.8 eV for the plasma-polymerized C2H2 film for both techniques. Brominated films revealed optical gap between 1.8 and 2.2 eV when produced by PECVD and always near 1.3 eV when produced by PIIID." @default.
- W839984881 created "2016-06-24" @default.
- W839984881 creator A5070678780 @default.
- W839984881 date "2013-08-09" @default.
- W839984881 modified "2023-09-23" @default.
- W839984881 title "Propriedades químicas e ópticas de filmes de carbono amorfo halogenados produzidos por deposição a vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (DIIIP)" @default.
- W839984881 hasPublicationYear "2013" @default.
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