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- W843526044 abstract "Microcrystalline SiC (µc-SiC) thin films have been obtained by using the electron cyclotron resonance (ECR) plasma CVD method. The result from X-ray diffraction measurement shows those films contain crystalline phase SiC without crystalline phase Si. And, the use of Si(CH3)2H2 as a source gas has been found effective for µc-SiC formation by ECR plasma CVD method." @default.
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- W843526044 date "1992-01-01" @default.
- W843526044 modified "2023-09-24" @default.
- W843526044 title "Study of Optimum Condition for Microcrystalline SiC Film Formation by ECR Plasma CVD Method" @default.
- W843526044 cites W2137181770 @default.
- W843526044 cites W75886972 @default.
- W843526044 doi "https://doi.org/10.1007/978-3-642-84804-9_41" @default.
- W843526044 hasPublicationYear "1992" @default.
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