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- W858199617 abstract "In this paper, Ni-Co alloy was used to improve thermal stability of Ni Germanide. It was found that uniform germanide is obtained on epitaxial Ge-on-Si substrate by employing Ni-Co alloy. Moreover, neither agglomeration nor penetration is observed during post-germanidation annealing process. The thermal stability of Ni germanide using Ni-Co alloy is improved due to the less agglomeration of Germanide. Therefore, the proposed Ni-Co alloy is promising for highly thermal immune Ni germanide for nano scale Ge-MOSFETs technology." @default.
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- W858199617 date "2008-08-01" @default.
- W858199617 modified "2023-10-16" @default.
- W858199617 title "Thermal Stability Improvement of Ni-germanide using Ni-Co alloy for Ge-MOSFETs Technology" @default.
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- W858199617 doi "https://doi.org/10.4313/jkem.2008.21.8.733" @default.
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