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- W859969105 abstract "The growth and microstructural characterization of epitaxial yttrium silicide () on the (100)Si substrate are investigated. The film grow epitaxilly through the solid phase reaction during vacuum annealing above . The epitaxial relationships between the hexagonal film and the (100)Si substrate are [0001]//[011]Si and [0001]//[011]Si in the (1100)//(100)Si plane relation. The YSi film consists of the two types of domains which have two different azimuthal orientations making an angle of to each other. The two types of domains in the film are equivalent in volume fraction and crystalline quality, which has been proved from the equivalent integrated intensities of (2201) asymmetric reflection of X-ray diffraction. The formation of a double -domain structure is discussed on the basis of geometrical matching at interface between the (1100) film and the (100)Si substrate, and growth model is proposed." @default.
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- W859969105 date "1997-01-01" @default.
- W859969105 modified "2023-09-24" @default.
- W859969105 title "Epitaxial growth and microstructural characterization of $YSi_2$ films on (100)Si substrate" @default.
- W859969105 hasPublicationYear "1997" @default.
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