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- W860160503 abstract "In deep anisotropic etching of (100)-oriented Si substrate, it could be observed that the non-uniformities existing near the etched-edge were caused by lattice defects and mechanical stress at the etching interface." @default.
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- W860160503 title "Short Consideration on the Non-Uniformities Existing at the Etched-edges in Deep Anisotropic Etching of(100) Silicon" @default.
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