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- W90569357 abstract "As a substitute material for silicon, we synthesized few layer graphene (FLG) by CVD process with a 300-nm-thick nickel film deposited on the silicon substrate and found out the lowest temperature for graphene synthesis. Raman spectroscopy study showed that the D peak (wave length : <TEX>${sim}1,350;cm^{-1}$</TEX>) of graphene was minimized and then the 2D one (wave length : <TEX>${sim}2,700;cm^{-1}$</TEX>) appeared when rapid thermal anneal is carried out with the <TEX>$C_2H_2$</TEX> treated nickel film. This study demonstrates that a high quality FLG formed at a low temperature of <TEX>$400^{circ}C$</TEX> is applicable as CMOS devices and transparent electrode materials." @default.
- W90569357 created "2016-06-24" @default.
- W90569357 date "2009-12-01" @default.
- W90569357 modified "2023-10-17" @default.
- W90569357 title "Graphene Synthesis by Low Temperature Chemical Vapor Deposition and Rapid Thermal Anneal" @default.
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- W90569357 doi "https://doi.org/10.4313/jkem.2009.22.12.1095" @default.
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