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- W909369468 abstract "Fe/Ti multilayers (MLs) were prepared on glass substrates using UHV RF/DC magnetron sputtering. The results showed a significant drop in coercivity measured for the Fe/Ti MLs with decreasing Fe layer thickness, typically from H c ≈ 2.2 kA/m to H c ≈ 0.2 kA/m, observed at a critical Fe thickness of dcrit ≈ 2.3 nm. Structural studies showed that the deposition of a 0.18 nm Fe/0.22 nm Ti ML at 285 K leads to the formation of a uniform amorphous Fe–Ti alloy thin film due to strong interdiffusion during growth. On the other hand, in situ annealing of this ML at 750 K for 2 h resulted in the creation of a nanocrystalline phase. Furthermore, in situ XPS studies showed that the valence band of the nanocrystalline Fe–Ti alloy film is broader than that measured for the amorphous phase with the same average composition." @default.
- W909369468 created "2016-06-24" @default.
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- W909369468 date "2006-01-01" @default.
- W909369468 modified "2023-09-24" @default.
- W909369468 title "Structure and electronic properties of Fe-Ti thin films" @default.
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- W909369468 hasPublicationYear "2006" @default.
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