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- W924339985 abstract "为了获得采用EB-PVD技术制备Ti-Al薄板的合理工艺参数,分析了Ti-Al薄板在实际试验条件下的蒸发与沉积过程.采用相关热学理论,结合分析试验的方法并依照EB-PVD工艺特点,对蒸气粒子的传输、饱和蒸气压对蒸发原子的影响以及Al的再蒸发进行了研究.结果表明：EB-PVD工艺制备Ti-Al薄板的最佳靶基距为280mm;饱和蒸气压的差异使得材料截面呈现分层特征;加入Nb片可以减小由于Ti、Al的蒸发速率差异导致的沉积材料与靶材之间的成分偏差,Al在基板上的2次蒸发可忽略不计.工艺参数的合理设计及在熔池中添加Nb金属,能够提高Ti-Al薄板的沉积速率,并降低由于元素饱和蒸气压的差别对成分偏析的影响." @default.
- W924339985 created "2016-06-24" @default.
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- W924339985 date "2010-01-01" @default.
- W924339985 modified "2023-09-24" @default.
- W924339985 title "EB-PVD工艺参数对沉积Ti-Al薄板的影响" @default.
- W924339985 hasPublicationYear "2010" @default.
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