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- W931248087 abstract "Diamond thin films were deposited on p-type (100) Si wafers using MPECVD. Prior to deposition, ultrasonic striking was done to improve density of nucleation sites with dimond powder of 40~m size. Then diamond thin films were deposited at , 40Torr and 1000W microwave power using and gases. The purity, the morphology and the microstructur'e and microdefects of diamond thin films were characterized by Raman spectroscopy, SEM and TEM, repectively. In Raman spectroscopy the peaks of non-diamond phase increased as , concentration increased. In SEM, the morphology of diamond thin films varied from crystalline to cauliflower as , concentration increased. As con centration increased, the density of defects increased, with most defects being {III} twin. , were formed with five (II]) planes. As these (Ill) Planes were twinned, , represented five-fold symmetry. ]n the interfaces, defects in diamond thin films fanned out from small regions implying nucleation sites." @default.
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- W931248087 date "1996-01-01" @default.
- W931248087 modified "2023-09-23" @default.
- W931248087 title "Microstructure and Microdefects of Diamond Thin Films Deposited by MPECVD" @default.
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