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- W958111010 endingPage "531" @default.
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- W958111010 abstract "Publisher Summary This chapter follows the destiny of cathode atoms from the cathode surface, the birth place of cathode spots, phase transition to expanding plasma, travel of plasma ions through the interelectrode space, until they impact onto the substrate surface and become inserted below the substrate's surface (subplantation film growth). This chapter also addresses the macroparticle issue and practical measures, such as macroparticle filters, to mitigate their deleterious effects. Examples are given for the construction of arc sources and other hardware. A few important examples of cathodic arc plasma deposition, both unfiltered and filtered are presented. The deposition of films by cathodic arcs is very likely the oldest physical vapor deposition (PVD) technology. Cathodic arcs are of great interest to the coatings community for several reasons. Among them are: the high deposition rates of metal and compound films; generally good to very good adhesion of coatings; the relative ease of forming hard and decorative coatings; and the relatively wide range of useable partial pressure of reactive gas when forming stoichiometric films. On the negative side, the formation of macroparticles and their incorporation into the coating degrades the quality of the film. Deleterious effects in corrosion tests are obvious and post-deposition polishing and buffing is often necessary for decorative applications." @default.
- W958111010 created "2016-06-24" @default.
- W958111010 creator A5069665776 @default.
- W958111010 date "2010-01-01" @default.
- W958111010 modified "2023-10-14" @default.
- W958111010 title "Unfiltered and Filtered Cathodic Arc Deposition" @default.
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