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- W976290400 abstract "This chapter reviews the basic properties, major chemical vapor deposition (CVD) reactions and processes, and the present and potential applications of the ceramic materials, particularly nitrides. Nitrides are hard and wear-resistant and have high melting points and good chemical resistance. They include several of the refractory-metal (interstitial) nitrides and three covalent nitrides: those of aluminum, boron, and silicon. The chapter also discusses the CVD of aluminum nitride (AlN), which is a stable covalent compound with a combination of high thermal conductivity and high electrical insulation. Many CVD reactions use ammonia (NH3) as a source of nitrogen for the deposition of nitrides. AlN is produced by CVD in the form of coatings and powder, both experimentally and on a production basis, by high temperature reactions in a hydrogen atmosphere at a low pressure (1 Torr) with ammonia and either the chloride or the bromide as metal sources. The chapter discusses various other nitrides such as hafnium nitride and niobium nitride, which are important industrial materials and have a number of major applications in cutting and grinding tools, wear surfaces, and semiconductors." @default.
- W976290400 created "2016-06-24" @default.
- W976290400 creator A5049651221 @default.
- W976290400 date "1999-01-01" @default.
- W976290400 modified "2023-09-23" @default.
- W976290400 title "The CVD of Ceramic Materials" @default.
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- W976290400 doi "https://doi.org/10.1016/b978-081551432-9.50013-9" @default.
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