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- W980522017 abstract "In order to investigate electronic and bonding structures in hydrogenated amorphous silicon carbide (a-SiC:H) films, an x-ray photoelectron spectroscopy (XPS) study was carried out. The films investigated were produced in an inductively-coupled glow-discharge plasma CVD system. The source gases were SiH4 and CH4. The amorphous film chemistry and composition were evaluated for a range of source gas mixtures and are compared with data obtained from a crystalline silicon carbide sample. The specific surface chemical bonds and bulk bonds were contrasted. In addition to the tetrahedral silicon-carbon bonds formed during film growth, a secondary species of carbon bond was found. This finding suggests that a form of non-tetrahedral carbon bonds is present in the as-grown amorphous silicon carbide material." @default.
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- W980522017 date "1989-01-01" @default.
- W980522017 modified "2023-09-23" @default.
- W980522017 title "X-Ray Photoelectron Spectroscopy Study of Hydrogenated Amorphous Silicon Carbide Films" @default.
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- W980522017 doi "https://doi.org/10.1007/978-3-642-75048-9_15" @default.
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