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• W988652024 abstract "While photochemistry in gases, liquids and solids has a long and well-documented record [3.1], and photochemistry, including photoelectrochemistry, at semiconductor-adsorbate interfaces is well known [3.2], photochemistry at adsorbate-metal interfaces is a newly emerging and rapidly expanding area of surface chemistry. There are also a number of recent interesting experiments involving photochemistry of molecules adsorbed at insulator surfaces [3.3]. In this paper we focus on bond cleavage within the first monolayer of adsorbate rather than on adsorbate-metal bond cleavage or photochemistry in multilayers. The latter topic has been the subject of a number of investigations and reviews [3.4–6], Table 3.1 lists a number of recent successful photochemical intraadsorbate bond cleavage experiments [3.7–27]. An interesting comparison is given in Table 3.2, which lists experiments where no photochemistry was observed [3.28–31]." @default.
• W988652024 created "2016-06-24" @default.
• W988652024 creator A5067048852 @default.
• W988652024 date "1990-01-01" @default.
• W988652024 modified "2023-09-27" @default.
• W988652024 title "Photochemistry at Adsorbate-Metal Interfaces: Intra-adsorbate Bond Breaking" @default.
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• W988652024 doi "https://doi.org/10.1007/978-3-642-75762-4_3" @default.
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